RECENT ADVANCES IN X-RAY-LITHOGRAPHY

被引:11
作者
CERRINA, F
机构
[1] Electrical and Computer Engineering, University of Wisconsin Madison
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1992年 / 31卷 / 12B期
关键词
LITHOGRAPHY; X-RAYS; SYNCHROTRONS; X-RAY LITHOGRAPHY; MASKS; IMAGE FORMATION;
D O I
10.1143/JJAP.31.4178
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report some significant developments in the area of X-ray technology, in the area of the modeling of image formation, in distortion control and in mask replication. Early simple models have been replaced by complete optical calculations based on physical optics and including all relevant factors. These models provide good agreement with the available experimental results. In the area of mask distortions, the use of finite element analysis models has clarified the roles played by the various sources of stress and explained in greater detail the origin of temperature changes. These progresses have paved the way to the optimization of the exposure system and to the achievement of the large exposure latitude potential of X-ray lithography.
引用
收藏
页码:4178 / 4184
页数:7
相关论文
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