HIGH-TEMPERATURE OPERATION OF SILICON-CARBIDE MOSFET

被引:18
作者
KONDO, Y
TAKAHASHI, T
ISHII, K
HAYASHI, Y
SAKUMA, E
MISAWA, S
DAIMON, H
YAMANAKA, M
YOSHIDA, S
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1987年 / 26卷 / 02期
关键词
D O I
10.1143/JJAP.26.310
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:310 / 311
页数:2
相关论文
共 4 条
  • [1] BEASOM JD, 1981, 1981 INT EL DEV M NE, P350
  • [2] EXPERIMENTAL 3C-SIC MOSFET
    KONDO, Y
    TAKAHASHI, T
    ISHII, K
    HAYASHI, Y
    SAKUMA, E
    MISAWA, S
    DAIMON, H
    YAMANAKA, M
    YOSHIDA, S
    [J]. IEEE ELECTRON DEVICE LETTERS, 1986, 7 (07) : 404 - 406
  • [3] NISHINO S, 1984, 16TH INT C SOL STAT, P8
  • [4] HIGH-TEMPERATURE ELECTRICAL-PROPERTIES OF 3C-SIC EPITAXIAL LAYERS GROWN BY CHEMICAL VAPOR-DEPOSITION
    SASAKI, K
    SAKUMA, E
    MISAWA, S
    YOSHIDA, S
    GONDA, S
    [J]. APPLIED PHYSICS LETTERS, 1984, 45 (01) : 72 - 73