COMPARISON OF PROPERTIES OF DIFFERENT MATERIALS USED AS MASKS FOR ION-BEAM ETCHING

被引:26
作者
CANTAGREL, M [1 ]
机构
[1] THOMSON CSF,LAB CENT RECH,91401 ORSAY,FRANCE
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 06期
关键词
D O I
10.1116/1.568534
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1340 / 1343
页数:4
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