APPLICATION OF SNOX THIN-FILMS PREPARED BY MICROWAVE PLASMA CVD TO A NOX SENSOR

被引：2

作者：

NAGASE, H

HIRONO, T

OKAMOTO, Y

IMANAKA, T

机构：

[1] Dept. of Chemical Engineering, Osaka University, Toyonaka

来源：

KAGAKU KOGAKU RONBUNSHU | 1993年 / 19卷 / 05期

关键词：

ENVIRONMENT; SENSOR; NITROGEN OXIDES; TIN OXIDE; CHEMICAL VAPOR DEPOSITION; MICROWAVE PLASMA;

D O I：

10.1252/kakoronbunshu.19.856

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

Tin oxide thin films were deposited by a microwave plasma CVD method using tetramethyltin mixed in oxygen and argon. Gas responses of the film were examined by measuring the change in film resistance. The resistance increased when the film was exposed to air containing NO2. A reversible response was observed above 250-degrees-C.

引用

页码：856 / 862

页数：7