EXCIMER KINETICS AND MULTILINE MODEL FOR THE ELECTRON-BEAM PUMPED XEF(B-X) LASER

被引:26
作者
BLAUER, JA
YANG, TT
TURNER, CE
COPELAND, DA
机构
来源
APPLIED OPTICS | 1984年 / 23卷 / 23期
关键词
D O I
10.1364/AO.23.004352
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
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页码:4352 / 4367
页数:16
相关论文
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