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EXCIMER KINETICS AND MULTILINE MODEL FOR THE ELECTRON-BEAM PUMPED XEF(B-X) LASER

被引：26
作者：
BLAUER, JA
YANG, TT
TURNER, CE
COPELAND, DA
机构：
来源：
APPLIED OPTICS | 1984年 / 23卷 / 23期
关键词：
D O I：
10.1364/AO.23.004352
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：4352 / 4367
页数：16
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