2-BODY AND 3-BODY QUENCHING OF XEFSTAR BY AR AND XE

被引：43

作者：

ROKNI, M ^{[1
]}

JACOB, JH ^{[1
]}

MANGANO, JA ^{[1
]}

BROCHU, R ^{[1
]}

机构：

[1] AVCO CORP,EVERETT RES LAB,EVERETT,MA 02149

来源：

关键词：

D O I：

10.1063/1.89440

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：458 / 460

页数：3

共 21 条

[1] HIGH-POWER XENON FLUORIDE LASER
AULT, ER
BRADFORD, RS
BHAUMIK, ML
[J]. APPLIED PHYSICS LETTERS, 1975, 27 (07) : 413 - 415
[2] HIGH-EFFICIENCY KRF EXCIMER LASER
BHAUMIK, ML
BRADFORD, RS
AULT, ER
[J]. APPLIED PHYSICS LETTERS, 1976, 28 (01) : 23 - 24
[3] BRASHEARS HC, UNPUBLISHED
[4] 354-NM LASER ACTION ON XEF
BRAU, CA
EWING, JJ
[J]. APPLIED PHYSICS LETTERS, 1975, 27 (08) : 435 - 437
[5] BRAU CA, UNPUBLISHED
[6] CHAMPAGNE LF, 1976, 3RD SUMM C EL TRANS
[7] ATTACHMENT-DOMINATED ELECTRON-BEAM-IONIZED DISCHARGES
DAUGHERTY, JD
MANGANO, JA
JACOB, JH
[J]. APPLIED PHYSICS LETTERS, 1976, 28 (10) : 581 - 583
[8] EDEN GJ, 1976, 3RD SUMM C EL TRANS
[9] LASER ACTION ON SIGMA-2+1-2 -] SIGMA-2+1-2 BANDS OF KRF AND XECL
EWING, JJ
BRAU, CA
[J]. APPLIED PHYSICS LETTERS, 1975, 27 (06) : 350 - 352
[10] HAWRYLUK A, 1976, 3RD SUMM C EL TRANS