2-BODY AND 3-BODY QUENCHING OF XEFSTAR BY AR AND XE

被引：43

作者：

ROKNI, M ^{[1
]}

JACOB, JH ^{[1
]}

MANGANO, JA ^{[1
]}

BROCHU, R ^{[1
]}

机构：

[1] AVCO CORP,EVERETT RES LAB,EVERETT,MA 02149

来源：

APPLIED PHYSICS LETTERS | 1977年 / 30卷 / 09期

关键词：

D O I：

10.1063/1.89440

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：458 / 460

页数：3

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共 21 条

[11] HYMAN H, COMMUNICATION
[12] MODELING KRF LASER DISCHARGE
JACOB, JH
MANGANO, JA
[J]. APPLIED PHYSICS LETTERS, 1976, 28 (12) : 724 - 726
[13] VACUUM ULTRAVIOLET ABSORPTION SPECTRUM AND DIPOLE MOMENT OF NITROGEN TRIFLUORIDE
LAPAGLIA, S
DUNCAN, ABF
[J]. JOURNAL OF CHEMICAL PHYSICS, 1961, 34 (03) : 1003 - &
[14] LORENTS DC, 1976, 3RD SUMM C EL TRANS
[15] ELECTRON PHOTODETACHMENT CROSS SECTION OF NEGATIVE ION OF FLUORINE
MANDL, A
[J]. PHYSICAL REVIEW A, 1971, 3 (01): : 251 - &
[16] ELECTRON-BEAM-CONTROLLED DISCHARGE PUMPING OF XEF LASER
MANGANO, JA
JACOB, JH
DODGE, JB
[J]. APPLIED PHYSICS LETTERS, 1976, 29 (07) : 426 - 428
[17] ELECTRON-BEAM-CONTROLLED DISCHARGE PUMPING OF KRF LASER
MANGANO, JA
JACOB, JH
[J]. APPLIED PHYSICS LETTERS, 1975, 27 (09) : 495 - 498
[18] ELECTRON-IMPACT CROSS-SECTIONS FOR ARGON
PETERSON, LR
ALLEN, JE
[J]. JOURNAL OF CHEMICAL PHYSICS, 1972, 56 (12) : 6068 - &
[19] SATURATION EFFECTS IN HIGH-GAIN LASERS
RIGROD, WW
[J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (08) : 2487 - &
[20] STIMULATED EMISSION AT 281.8 NM FROM XEBR
SEARLES, SK
HART, GA
[J]. APPLIED PHYSICS LETTERS, 1975, 27 (04) : 243 - 245