SPUTTERING EFFECT OF GAS CLUSTER ION-BEAMS

被引：20

作者：

YAMAGUCHI, T ^{[1
]}

MATSUO, J ^{[1
]}

AKIZUKI, M ^{[1
]}

ASCHERON, CE ^{[1
]}

TAKAOKA, GH ^{[1
]}

YAMADA, I ^{[1
]}

机构：

[1] KYOTO UNIV,ION BEAM ENGN EXPTL LAB,KYOTO 606,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1995年 / 99卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(94)00701-2

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Sputtering effects of CO2 cluster ion beams have been studied in comparison with the effect of monomer ions. A surface smoothing effect was obtained for Au, Pt, Cu, poly-Si, SiO2 and Si3N4 films, Si substrates and Soda-lime glasses. The energy dependence of smoothing and sputtered depth was different, and a higher ratio between reduction of surface roughness and sputtered depth was obtained at lower cluster energy. Surface smoothing can be achieved by cluster ion irradiation even at 5 keV. Cluster ion irradiation-induced sputtering produced very flat surfaces due to a different sputtering behaviour from monomer ions, which is expressed as lateral sputtering.

引用

页码：237 / 239

页数：3

共 12 条

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AKIZUKI M, IN PRESS SURF REV LE

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