CONTOURING BY ELECTRONIC SPECKLE PATTERN INTERFEROMETRY EMPLOYING DUAL BEAM ILLUMINATION

被引：50

作者：

JOENATHAN, C ^{[1
]}

PFISTER, B ^{[1
]}

TIZIANI, HJ ^{[1
]}

机构：

[1] UNIV STUTTGART,INST TECH OPT,W-7000 STUTTGART 80,GERMANY

来源：

APPLIED OPTICS | 1990年 / 29卷 / 13期

关键词：

ESPI; Interferometry; Speckle interferometry; Speckles;

D O I：

10.1364/AO.29.001905

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In this paper we extend and study the method for generating contours of diffuse objects employing a dual beam illumination coupled with electronic speckle pattern interferometry. The sensitivity and the orientation of the contour planes are analyzed. A novel method for tilting the planes of contours and experimental results incorporating phase shifting and fringe analysis are also presented. The theoretical and the experimental results show good agreement. © 1990 Optical Society of America.

引用

页码：1905 / 1911

页数：7

共 11 条

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