UNDERPOTENTIAL DEPOSITION OF LEAD ON COPPER(111) - A STUDY USING A SINGLE-CRYSTAL ROTATING-RING ELECTRODE AND EX-SITU LOW-ENERGY-ELECTRON DIFFRACTION AND AUGER-ELECTRON SPECTROSCOPY

被引：78

作者：

BRISARD, GM ^{[1
]}

ZENATI, E ^{[1
]}

GASTEIGER, HA ^{[1
]}

MARKOVIC, NM ^{[1
]}

ROSS, PN ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY,LAWRENCE BERKELEY LAB,BERKELEY,CA 94720

来源：

LANGMUIR | 1995年 / 11卷 / 06期

关键词：

D O I：

10.1021/la00006a060

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The underpotential deposition of Pb was studied on Cu(111) single crystal surfaces prepared both by a novel electropolishing procedure and by sputtering/annealing in ultrahigh vacuum. Identical,results were found with both methods. Pb atoms are deposited underpotentially on Cu(111) into a compact nonrotated hexagonal overlayer. The measured Pb coverage at saturation is 53% with respect to the Cu(111) substrate and is identical to the packing density of the (111) plane of bulk Pb. The presence of Cl- in the supporting electrolyte has a strong effect on the potential region where deposition/stripping occurs and on the reversibility of the reaction.

引用

页码：2221 / 2230

页数：10

共 43 条

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