ELECTROCHEMICAL AND CORROSION BEHAVIOR OF ARGON-IMPLANTED ARMCO IRON

被引：9

作者：

BONORA, PL ^{[1
]}

CERISOLA, G ^{[1
]}

FEDRIZZI, L ^{[1
]}

TOSELLO, C ^{[1
]}

机构：

[1] IST RIC SCI & TECNOL,I-38050 POVO,ITALY

来源：

MATERIALS SCIENCE AND ENGINEERING | 1985年 / 69卷 / 02期

关键词：

ARGON - Ion Implantation - CORROSION - ELECTROCHEMISTRY;

D O I：

10.1016/0025-5416(85)90324-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Ion implantation induces subdivision in the substructures of metal lattices. However, after Ar** plus ions have been implanted into Armco iron samples at a nominal dose of 10**1**5, 10**1**6 or 10**1**7 ions cm** minus **2, in the absence of a chemical contribution of the implanted species it was found that no electrochemical or corrosion feature of the metal was noticeably affected; however, the attack morphology in its initial stage is modified both in Nital etching solution and under pitting attack by chlorides; and ion beam mixing at the oxidized metal surface is possible, producing different effects for various Ar** plus ion doses. Oxygen is probably inserted into the metal structures at lower Ar** plus ion doses and sputtered away at higher Ar** plus ion doses.

引用

页码：283 / 287

页数：5