ELECTRONIC SPUTTERING OF SOLID N-2 AND O-2 - A COMPARISON OF NONRADIATIVE RELAXATION PROCESSES

被引：29

作者：

ROOK, FL ^{[1
]}

JOHNSON, RE ^{[1
]}

BROWN, WL ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

SURFACE SCIENCE | 1985年 / 164卷 / 2-3期

关键词：

D O I：

10.1016/0039-6028(85)90769-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：625 / 639

页数：15

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