PHOTOCHEMISTRY OF AZIDE-PHENOLIC RESIN PHOTORESISTS

被引：9

作者：

HASHIMOTO, M

IWAYANAGI, T

SHIRAISHI, H

NONOGAKI, S

机构：

来源：

POLYMER ENGINEERING AND SCIENCE | 1986年 / 26卷 / 16期

关键词：

D O I：

10.1002/pen.760261603

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：1090 / 1095

页数：6

共 16 条

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