CHEMISORPTION AND PHYSISORPTION OF SIMPLE ALCOHOLS ON CLEAVED SILICON

被引：11

作者：

PIANCASTELLI, MN

ZANONI, R

MARSI, M

MARGARITONDO, G

机构：

[1] UNIV ROME LA SAPIENZA,DEPT CHEM,I-00185 ROME,ITALY

[2] UNIV WISCONSIN,CTR SYNCHROTRON RADIAT,MADISON,WI 53706

[3] UNIV WISCONSIN,DEPT PHYS,MADISON,WI 53706

[4] ECOLE POLYTECH FED LAUSANNE,INST APPL PHYS,CH-1015 LAUSANNE,SWITZERLAND

来源：

SOLID STATE COMMUNICATIONS | 1991年 / 79卷 / 01期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/0038-1098(91)90470-G

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

We investigated the adsorption properties of methanol and ethanol on Si(111)2 x 1 as a function of temperature in the range 80-300 K by means of synchrotron radiation photoemission of core and valence levels. A physisorbed state is characterized at 80 K, whereas at 300 K an alcohoxy species is formed. White-light exposures promote a decomposition reaction which leads to carbon on the Si surface, either on elemental form or as CH(x) groups.

引用

页码：13 / 16

页数：4

共 11 条

[1]

EDAMOTO K, 1984, SURF SCI, V146, pL533, DOI 10.1016/0039-6028(84)90216-4

[2]

Kimura K., 1981, HDB HEI PHOTOELECTRO

[3] NEXAFS STUDIES OF COMPLEX ALCOHOLS AND CARBOXYLIC-ACIDS ON THE SI(111)(7X7) SURFACE [J].