PRELIMINARY EVALUATION OF A LASER-BASED PROXIMITY X-RAY STEPPER

被引:4
作者
FRACKOVIAK, J [1 ]
CELLER, GK [1 ]
FREEMAN, RR [1 ]
JURGENSEN, CW [1 ]
KOLA, RR [1 ]
NOVEMBRE, AE [1 ]
TAI, WW [1 ]
THOMPSON, LF [1 ]
TRIMBLE, LE [1 ]
TOMES, DN [1 ]
机构
[1] HAMPSHIRE INSTRUMENTS INC,MARLBOROUGH,MA 01752
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 06期
关键词
D O I
10.1116/1.585286
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports on the initial lithographic evaluation of a commercial 1:1 proximity stepper that uses a laser-based plasma x-ray source. Our preliminary tests have shown that 0.4- and 0.5-mu-m lines and spaces can be printed consistently on Si wafers using a positive resist, which has a sensitivity of 6-10 mJ/cm2. Features smaller than 0.4-mu-m can be obtained, but the overlay accuracy of this system is targeted at 0.5-mu-m design rules. The 3-sigma spread in linewidth is greater than 0.05-mu-m, however, the stepper contribution must be separated from the resist processing issues, reticle critical dimension variations, and scanning electron micrograph measurement precision.
引用
收藏
页码:3198 / 3201
页数:4
相关论文
共 8 条
[1]  
Dossel K.-F., 1986, Microelectronic Engineering, V5, P97, DOI 10.1016/0167-9317(86)90035-3
[2]  
LINGNAU J, 1989, SOLID STATE TECHNOL, V32, P105
[3]  
Nalamasu O., 1990, Proceedings of the SPIE - The International Society for Optical Engineering, V1262, P32, DOI 10.1117/12.20136
[4]  
Parikh M., 1985, Semiconductor International, V8, P222
[5]  
Peters D. W., 1988, Microelectronic Manufacturing and Testing, V11, P21
[6]  
Peters D. W., 1988, Microelectronic Manufacturing and Testing, V11, P7
[7]   CALIBRATION AND CHARACTERIZATION OF A PULSED SOFT-X-RAY SOURCE [J].
PETERS, DW ;
DARDZINSKI, BJ ;
KELLY, DR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06) :1624-1627
[8]  
Preston S. M., 1989, Proceedings of the SPIE - The International Society for Optical Engineering, V1089, P164