CHARACTERIZATION OF ANODIC SULFIDE FILMS ON HG0.78CD0.22TE

被引：38

作者：

STRONG, RL ^{[1
]}

LUTTMER, JD ^{[1
]}

LITTLE, DD ^{[1
]}

TEHERANI, TH ^{[1
]}

HELMS, CR ^{[1
]}

机构：

[1] STANFORD UNIV,STANFORD,CA 94305

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 05期

关键词：

D O I：

10.1116/1.574839

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：3207 / 3210

页数：4

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[10] QUANTITATIVE MEASUREMENTS OF THE STOICHIOMETRY OF ANODIC OXIDES GROWN ON HG0.78CD0.22 TE [J].

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