EXCIMER AND DYE-LASER ANNEALING OF SILICON-NITRIDE-CAPPED, SI-IMPLANTED GAAS

被引:6
作者
COMPAAN, A [1 ]
ABBI, SC [1 ]
YAO, HD [1 ]
BHAT, A [1 ]
LANGER, DW [1 ]
机构
[1] USAF,AVION LAB,WRIGHT PATTERSON AFB,OH 45433
关键词
D O I
10.1063/1.339448
中图分类号
O59 [应用物理学];
学科分类号
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页码:2561 / 2563
页数:3
相关论文
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