DEPOSITION OF HARD COATINGS BY A HOLLOW-CATHODE ARC EVAPORATION DEVICE

被引：7

作者：

LUNK, A

机构：

[1] Department of Physics, E-M-A Universität, Greifswald

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1991年 / 140卷

关键词：

D O I：

10.1016/0921-5093(91)90493-7

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The hollow-cathode are (HCA) is characterized by a high charge carrier density and the existence of beam electrons. This is favourable for plasma-activated deposition. This paper will analyse the energy, fluxes to the substrate and the dependences upon the bias voltage. As examples of hard coating deposited with the HCA, selected properties of titanium nitride and silicon nitride coatings are discussed.

引用

页码：666 / 669

页数：4