REACTIVE SPUTTERING CHARACTERISTICS OF SILICON IN AN AR-N2 MIXTURE

被引：56

作者：

OKAMOTO, A

SERIKAWA, T

机构：

[1] NTT, Musashino, Jpn, NTT, Musashino, Jpn

来源：

THIN SOLID FILMS | 1986年 / 137卷 / 01期

关键词：

D O I：

10.1016/0040-6090(86)90202-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：143 / 151

页数：9

共 17 条

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