REACTIVE SPUTTER DEPOSITION - A QUANTITATIVE-ANALYSIS

被引：53

作者：

HOHNKE, DK

SCHMATZ, DJ

HURLEY, MD

机构：

来源：

THIN SOLID FILMS | 1984年 / 118卷 / 03期

关键词：

D O I：

10.1016/0040-6090(84)90201-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：301 / 310

页数：10

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[8] TRANSPARENT CONDUCTING ZINC-OXIDE AND INDIUM TIN OXIDE-FILMS PREPARED BY MODIFIED REACTIVE PLANAR MAGNETRON SPUTTERING
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