NEW APPLICATION OF SE-GE GLASSES TO SILICON MICROFABRICATION TECHNOLOGY

被引：14

作者：

YOSHIKAWA, A ^{[1
]}

NAGAI, H ^{[1
]}

MIZUSHIMA, Y ^{[1
]}

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP,MUSASHINO ELECT COMMUN LAB,MUSASHINO,TOKYO 180,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1977年 / 16卷

关键词：

D O I：

10.7567/JJAPS.16S1.67

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：67 / 71

页数：5

共 12 条

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[2]

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[4]

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[5]

IGO T, 1973, OYO BUTURI S, V43, P106

[6] NEW APPLICATION OF SE-GE GLASSES TO SILICON MICROFABRICATION TECHNOLOGY [J].

NAGAI, H ;

YOSHIKAWA, A ;

TOYOSHIMA, Y ;

OCHI, O ;

MIZUSHIMA, Y .

APPLIED PHYSICS LETTERS, 1976, 28 (03) :145-147

[7] REVERSIBLE OPTICAL TRANSITION IN SE-GE AND P-SE-GE GLASSES [J].

OE, K ;

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NAGAI, H .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 1976, 20 (03) :405-411

[8]

SAKUMA H, 1972, OYO BUTURI S, V41, P76

[9]

SHIRAKAWA T, 1975, PHOTOGR SCI ENGNG, V2, P139

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TERAO M, 1972, OYO BUTURI S, V41, P68

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