ASYMMETRIC X-RAY BRAGG REFLECTION AND SHALLOW STRAIN DISTRIBUTION IN SILICON SINGLE-CRYSTALS

被引：28

作者：

FUKUHARA, A ^{[1
]}

TAKANO, Y ^{[1
]}

机构：

[1] HITACHI LTD,CENTR RES LAB,KOKUBUNJI,TOKYO,JAPAN

来源：

JOURNAL OF APPLIED CRYSTALLOGRAPHY | 1977年 / 10卷 / AUG1期

关键词：

D O I：

10.1107/S0021889877013508

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：287 / 290

页数：4

共 18 条

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