SUBMICROMETER PATTERNING BY PROJECTED EXCIMER-LASER-BEAM INDUCED CHEMISTRY

[1] CORRECTION FOR CHROMATIC ABERRATION IN MICROSCOPE PROJECTION PHOTOLITHOGRAPHY [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1983, 54 (10) : 1292 - 1295

[2] BUCKSBAUM PH, 1983, EXCIMER LASERS 1983, P279

[3] DANEU V, 1984, LASER CHEM PROCESSIN

[4] EFFICIENT SI SOLAR-CELLS BY LASER PHOTOCHEMICAL DOPING [J]. APPLIED PHYSICS LETTERS, 1981, 38 (03) : 144 - 146

[5] DUBROEUCQ GM, 1982, P INT C MICROCIRCUIT, P73

[6] EFREMOW NN, COMMUNICATION

[7] EHRLICH DJ, 1984, APPL PHYS LETT, V44, P267, DOI 10.1063/1.94694

[8] EHRLICH DJ, 1984, VLSI ELECTRONICS MIC, V7, P129

[9] EHRLICH DJ, 1983, J VAC SCI TECHNOL B, V1, P696

[10] EMERY K, 1984, P SPIE C LASER ASSIS, V459

[1] CORRECTION FOR CHROMATIC ABERRATION IN MICROSCOPE PROJECTION PHOTOLITHOGRAPHY [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1983, 54 (10) : 1292 - 1295

[2] BUCKSBAUM PH, 1983, EXCIMER LASERS 1983, P279

[3] DANEU V, 1984, LASER CHEM PROCESSIN

[4] EFFICIENT SI SOLAR-CELLS BY LASER PHOTOCHEMICAL DOPING [J]. APPLIED PHYSICS LETTERS, 1981, 38 (03) : 144 - 146

[5] DUBROEUCQ GM, 1982, P INT C MICROCIRCUIT, P73

[6] EFREMOW NN, COMMUNICATION

[7] EHRLICH DJ, 1984, APPL PHYS LETT, V44, P267, DOI 10.1063/1.94694

[8] EHRLICH DJ, 1984, VLSI ELECTRONICS MIC, V7, P129

[9] EHRLICH DJ, 1983, J VAC SCI TECHNOL B, V1, P696

[10] EMERY K, 1984, P SPIE C LASER ASSIS, V459