THE EFFECT OF INTERPOSING THIN OXIDE LAYERS ON THE PHOTOVOLTAIC PROPERTIES OF A-SI-H SOLAR CELLS-II BETWEEN THE MIDDLE NORMAL AND PARA LAYERS OF A TANDEM-TYPE CELL

被引：14

作者：

SAKAI, Y ^{[1
]}

FUKUYAMA, K ^{[1
]}

MATSUMURA, M ^{[1
]}

NAKATO, Y ^{[1
]}

TSUBOMURA, H ^{[1
]}

机构：

[1] OSAKA UNIV,FAC ENGN SCI,DEPT CHEM,TOYONAKA,OSAKA 560,JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 01期

关键词：

D O I：

10.1063/1.341440

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：394 / 398

页数：5

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