FORMATION OF COMPOUNDS BY HIGH-FLUX NITROGEN ION-IMPLANTATION IN TITANIUM

被引:52
作者
RAUSCHENBACH, B
机构
关键词
D O I
10.1007/BF01145500
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:395 / 404
页数:10
相关论文
共 38 条
[1]  
ANDREWS KW, 1971, INTERPRETATION ELECT, P21
[2]  
[Anonymous], 1966, CHEM DEPOSITED NONME
[3]   CHARACTERIZATION OF TITANIUM NITRIDE FILMS DEPOSITED ONTO SILICON [J].
ARMIGLIATO, A ;
CELOTTI, G ;
GARULLI, A ;
GUERRI, S ;
OSTOJA, P ;
ROSA, R ;
MARTINELLI, G .
THIN SOLID FILMS, 1982, 92 (04) :341-346
[4]   FORMATION OF CHEMICAL COMPOUNDS BY ION-BOMBARDMENT OF THIN TRANSITION-METAL FILMS [J].
BELII, IM ;
KOMAROV, FF ;
TISHKOV, VS ;
YANKOVSKII, VM .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1978, 45 (01) :343-352
[5]  
BORDERS JA, 1979, ANNU REV MATER SCI, V9, P313, DOI 10.1146/annurev.ms.09.080179.001525
[6]   PHASE-TRANSFORMATIONS AT BOMBARDMENT OF THIN-FILMS WITH IONS [J].
BYKOV, VN ;
TROYAN, VA ;
ZDOROVTSEVA, GG ;
KHAIMOVICH, VS .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1975, 32 (01) :53-61
[7]   TITANIUM NITRIDE FILMS PREPARED BY ION-IMPLANTATION [J].
CHEN, PA ;
YANG, TT .
THIN SOLID FILMS, 1981, 81 (01) :L91-L92
[8]   APPLICATIONS OF ION-IMPLANTATION IN METALS [J].
DEARNALEY, G .
THIN SOLID FILMS, 1983, 107 (03) :315-326
[9]   ION-BOMBARDMENT OF GROUP-IV ELEMENTAL METAL AND SYNTHETIC NITRIDE FILMS [J].
DUCKWORTH, RG ;
WILSON, IH .
THIN SOLID FILMS, 1979, 63 (02) :289-297
[10]  
EDINGTON JW, 1976, PRACTICAL ELECTRON M, P113