PREPARATION AND PROPERTIES OF REACTIVELY SPUTTERED TUNGSTEN-OXIDE FILMS

被引：35

作者：

KANEKO, H

MIYAKE, K

TERAMOTO, Y

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 04期

关键词：

D O I：

10.1063/1.331053

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：3070 / 3075

页数：6

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