THE EFFECT OF SUBSTITUENTS ON THE PHOTOSENSITIVITY OF 2-NITROBENZYL ESTER DEEP UV RESISTS

被引：26

作者：

REICHMANIS, E

WILKINS, CW

PRICE, DA

CHANDROSS, EA

机构：

来源：

关键词：

D O I：

10.1149/1.2119968

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1433 / 1437

页数：5

共 8 条

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[7] A NOVEL-APPROACH TO ORTHO-NITROBENZYL PHOTOCHEMISTRY FOR RESISTS [J].

REICHMANIS, E ;

WILKINS, CW ;

CHANDROSS, EA .

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[8]

WILKINS CL, UNPUB