DEPOSITION OF IRON-OXIDE THIN-FILMS BY PULSED LASER EVAPORATION

被引：27

作者：

OGALE, SB

KOINKAR, VN

JOSHI, S

GODBOLE, VP

DATE, SK

MITRA, A

VENKATESAN, T

WU, XD

机构：

[1] NATL CHEM LAB,POONA 411008,MAHARASHTRA,INDIA

[2] RUTGERS STATE UNIV,DEPT PHYS,PISCATAWAY,NJ 08854

来源：

APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 14期

关键词：

D O I：

10.1063/1.100427

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1320 / 1322

页数：3

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