EXPERIMENTAL RESULTS FROM FAST ELECTRON PATTERN GENERATOR - A VARIABLE SHAPED BEAM MACHINE

被引：7

作者：

DECHAMBOST, E

ALLANOS, B

FRICHET, A

PERROCHEAU, J

机构：

[1] Thomson-CSF, Orsay, Fr, Thomson-CSF, Orsay, Fr

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 01期

关键词：

ELECTRON BEAMS - Applications - GOLD AND ALLOYS - Applications - INTEGRATED CIRCUITS; VLSI - Fabrication - SEMICONDUCTING SILICON - Applications - TRANSISTORS; FIELD EFFECT - Fabrication;

D O I：

10.1116/1.583397

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Fast electron pattern generator (FEPG) is a variable shaped beam lithographic system specially designed for direct writing on wafers and for mask fabrication. Experimental results are given: gold gratings on silicon patterned with 10 multiplied by 0. 3 mu m spots, 1 mu m gate field-effect transistor (FET), masks 1 multiplied by . All these results performed with a 5 A/cm**2 current density are consistent with a 1 mu m technology. When the spot current exceeds 5 A/cm**2, defects due to the space charge effect appear. Thermal effects on glass substrates are pointed out.

引用

页码：73 / 77

页数：5