MICROSCOPIC CALCULATION OF ELECTROMAGNETIC-FIELDS IN REFRACTION AT A JELLIUM-VACUUM INTERFACE

被引：293

作者：

FEIBELMAN, PJ

机构：

[1] SANDIA LABS, 5151 ALBUQUERQUE, NM 87115 USA

[2] SUNY, PHYS DEPT, STONY BROOK, NY 11974 USA

来源：

PHYSICAL REVIEW B | 1975年 / 12卷 / 04期

关键词：

D O I：

10.1103/PhysRevB.12.1319

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1319 / 1336

页数：18

共 46 条

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