SELECTIVE AND STOICHIOMETRIC REACTION OF COPPER DIPIVALOYLMETHANATE [CU(DPM)2] WITH SURFACE HYDROXYLS ON SIO2

被引：37

作者：

SEKINE, R ^{[1
]}

KAWAI, M ^{[1
]}

机构：

[1] INST PHYS & CHEM RES,WAKO,SAITAMA 35101,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1990年 / 56卷 / 15期

关键词：

D O I：

10.1063/1.102500

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Stoichiometric reaction of copper dipivaloylmethanate [Cu(DPM)2] with the hydroxyl group (OH) on SiO2 surface was studied by infrared spectroscopy. The stoichiometric ratio of reacted OH and Cu(DPM)2 was estimated to be ∼2-3:1 from the absorbance of the OH and the CH stretching region. The ligand DPM was removed from the SiO2 surface by treatment with water at 400°C. The oxidation state of Cu remaining on the surface was proven to be +1 by x-ray photoelectron spectroscopy.

引用

页码：1466 / 1468

页数：3

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