THE ELECTRON MEAN FREE-PATH (APPLICABLE TO QUANTITATIVE ELECTRON-SPECTROSCOPY)

被引：66

作者：

TOKUTAKA, H

NISHIMORI, K

HAYASHI, H

机构：

来源：

SURFACE SCIENCE | 1985年 / 149卷 / 2-3期

关键词：

D O I：

10.1016/0039-6028(85)90068-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：349 / 365

页数：17

共 28 条

[21] AUGER SPECTRA AND LEED PATTERNS FROM NICKEL DEPOSITS ON CLEAVED SILICON [J].

RIDGWAY, JWT ;

HANEMAN, D .

SURFACE SCIENCE, 1971, 26 (02) :683-&

[22] AUGER SPECTRA AND LEED PATTERNS FROM VACUUM CLEAVED SILICON CRYSTALS WITH CALIBRATED DEPOSITS OF IRON [J].

RIDGWAY, JWT ;

HANEMAN, D .

SURFACE SCIENCE, 1971, 24 (02) :451-&

[23]

Seah M. P., 1979, Surface and Interface Analysis, V1, P2, DOI 10.1002/sia.740010103

[24] QUANTITATIVE AUGER-ELECTRON SPECTROSCOPY AND ELECTRON RANGES [J].

SEAH, MP .

SURFACE SCIENCE, 1972, 32 (03) :703-&

[25] ATTENUATION OF LOW-ENERGY ELECTRONS BY SOLIDS - RESULTS FROM X-RAY PHOTOELECTRON SPECTROSCOPY [J].

STEINHARDT, RG ;

HUDIS, J ;

PERLMAN, ML .

PHYSICAL REVIEW B-SOLID STATE, 1972, 5 (03) :1016-+

[26] ELECTRON MEAN FREE PATHS IN GE IN RANGE 70-1400EV [J].

SZAJMAN, J ;

JENKIN, JG ;

LIESEGANG, J ;

LECKEY, RCG .

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1978, 14 (01) :41-48

[27] ESCAPE LENGTH OF AUGER ELECTRONS [J].

TARNG, ML ;

WEHNER, GK .

JOURNAL OF APPLIED PHYSICS, 1973, 44 (04) :1534-1540

[28] A QUANTITATIVE AUGER-ELECTRON SPECTROSCOPY METHOD (APPLIED TO A THIN-FILM MONOLAYER OVERGROWTH) [J].

TOKUTAKA, H ;

NISHIMORI, K ;

TAKASHIMA, K ;

ICHINOKAWA, T .

SURFACE SCIENCE, 1983, 133 (2-3) :547-579

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