GENERATION OF A LARGE ELECTRON-BEAM FOR PLASMA PROCESSING

被引：1

作者：

SUGAI, H

YABUOSHI, N

TOYODA, H

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1989年 / 28卷 / 05期

关键词：

D O I：

10.1143/JJAP.28.L868

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：L868 / L870

页数：3

相关论文

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