CATHODOLUMINESCENCE IMAGING AND SPECTROSCOPY OF DISLOCATIONS IN SI AND SI1-XGEX ALLOYS

被引:42
作者
HIGGS, V [1 ]
LIGHTOWLERS, EC [1 ]
TAJBAKHSH, S [1 ]
WRIGHT, PJ [1 ]
机构
[1] OXFORD INSTRUMENTS LTD,OXFORD OX8 1TL,ENGLAND
关键词
D O I
10.1063/1.107676
中图分类号
O59 [应用物理学];
学科分类号
摘要
Dislocations in float-zone Si which has been plastically deformed and deliberately copper contaminated, and misfit dislocations in a relaxed Si1-xGex alloy layer grown on a Si substrate by molecular beam epitaxy, have been investigated by monochromatic and panchromatic cathodoluminescence imaging and by cathodoluminescence spectroscopy. The measurements show that the D3 and D4 luminescence features originate on the slip lines in plastically deformed Si and at the misfit dislocations in the Si1-xGex alloy layer whereas the D1 and D2 bands are dominant between the slip lines and the misfit dislocations.
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页码:1087 / 1089
页数:3
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