MAGNETIC-PROPERTIES OF FE-N/FE MULTILAYERED FILMS DEPOSITED BY AN OPPOSED TARGETS SPUTTERING

被引:3
作者
HOSHI, Y [1 ]
NAOE, M [1 ]
机构
[1] TOKYO INST TECHNOL,MEGURO KU,TOKYO 152,JAPAN
关键词
D O I
10.1109/20.104717
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Fe-N/Fe multilayer film has been deposited by an opposed target sputtering apparatus and their magnetic properties are investigated. Coercive force He of the Fe-N/Fe multilayer film takes a minimum value at a proper nitrogen content and decreases as the length of the layer period dlayer increases. This decrease in Hc is mainly due to the decrease in perpendicular magnetic anisotropy of the film. The film with dlayer of 1480 Å has a Hc of 1.5 Oe and saturation magnetization of 1600 emu/cc. Annealing at a temperature above 200 °C leads to the crystallization of the α-Fe and ϒ-Fe4N in the film. Besides, diffusion of the nitrogen atoms from the Fe-N layer to Fe layer becomes significant at a temperature above 400 °C and the layered structure in the film is disappeared by the annealing at a temperature above 450 °C. The coercive force Hc of the film takes a value in the range from 1 to 5 Oe independent on dlayer and nitrogen gas flow rate RN2 if the film is annealed at a temperature above 350°C. © 1990 IEEE
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页码:2341 / 2343
页数:3
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