OXIDATION OF CRNX HARD COATINGS REACTIVELY SPUTTERED AT LOW-TEMPERATURE

被引:30
作者
NAVINSEK, B
PANJAN, P
机构
[1] J. Stefan Institute, 61111 Ljubljana
关键词
D O I
10.1016/0040-6090(93)90718-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
[No abstract available]
引用
收藏
页码:4 / 6
页数:3
相关论文
共 9 条
  • [1] HARD CHROME COATINGS DEPOSITED BY PHYSICAL VAPOR-DEPOSITION
    AUBERT, A
    GILLET, R
    GAUCHER, A
    TERRAT, JP
    [J]. THIN SOLID FILMS, 1983, 108 (02) : 165 - 172
  • [2] HARD CHROME AND MOLYBDENUM COATINGS PRODUCED BY PHYSICAL VAPOR-DEPOSITION
    AUBERT, A
    DANROC, J
    GAUCHER, A
    TERRAT, JP
    [J]. THIN SOLID FILMS, 1985, 126 (1-2) : 61 - 67
  • [3] PROPERTIES OF ARC-EVAPORATED CRN AND (CR, AL)N COATINGS
    KNOTEK, O
    LOFFLER, F
    SCHOLL, HJ
    [J]. SURFACE & COATINGS TECHNOLOGY, 1991, 45 (1-3) : 53 - 58
  • [4] HARD COATINGS BY PLASMA-ASSISTED PVD TECHNOLOGIES - INDUSTRIAL PRACTICE
    MOLL, E
    BERGMANN, E
    [J]. SURFACE & COATINGS TECHNOLOGY, 1989, 37 (04) : 483 - 509
  • [5] MUNZ WD, 1985, REACTIVE NITRIDES CA
  • [6] SPUTTER DEPOSITION OF MULTILAYERED STRUCTURES FOR USE IN SPUTTER DEPTH PROFILE CALIBRATION
    NAVINSEK, B
    FINE, J
    [J]. VACUUM, 1986, 36 (10) : 711 - 714
  • [7] NAVINSEK B, PLASMA SURFACE ENG P
  • [8] A COMPARISON OF THE CORROSION BEHAVIOR AND HARDNESS OF STEEL SAMPLES (100CR6) COATED WITH TITANIUM NITRIDE AND CHROMIUM NITRIDE BY DIFFERENT INSTITUTIONS USING DIFFERENT DEPOSITION TECHNIQUES
    SCHROER, A
    ENSINGER, W
    WOLF, GK
    [J]. MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 140 : 625 - 630
  • [9] SCHULZ H, 1991, 18TH INT C MET COAT