STABILITY OF AMORPHOUS CU/TA AND CU/W ALLOYS

被引:124
作者
NASTASI, M
SARIS, FW
HUNG, LS
MAYER, JW
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D O I
10.1063/1.335855
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O59 [应用物理学];
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页码:3052 / 3058
页数:7
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  • [1] AZARNIA N, 1973, ACTA CRYST B, V27, P1170
  • [2] STABILITY OF AMORPHOUS-ALLOYS
    BUSCHOW, KHJ
    [J]. SOLID STATE COMMUNICATIONS, 1982, 43 (03) : 171 - 174
  • [3] METASTABLE ALLOY LAYERS PRODUCED BY IMPLANTATION OF AG-+ AND TA-+ IONS INTO CU CRYSTALS
    CULLIS, AG
    BORDERS, JA
    HIRVONEN, JK
    POATE, JM
    [J]. PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1978, 37 (05): : 615 - 630
  • [4] PHYSICAL STATE OF IMPLANTED TUNGSTEN IN COPPER
    CULLIS, AG
    POATE, JM
    BORDERS, JA
    [J]. APPLIED PHYSICS LETTERS, 1976, 28 (06) : 314 - 316
  • [5] DAVIES HA, 1976, PHYS CHEM GLASSES, V17, P159
  • [6] Elliot R. P., 1965, CONSTITUTION BINAR S
  • [7] FLYNN CP, 1972, POINT DEFECTS DIFFUS, pCH14
  • [8] GSCHNEIDNER KA, 1964, SOLID STATE PHYS, V16, P275
  • [9] Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700
  • [10] Hung L. Y., UNPUB