MICROWAVE PLASMA APPARATUS FOR DEPOSITION OF HYDROGENATED AMORPHOUS-CARBON LAYERS

被引：5

作者：

HAMMER, K ^{[1
]}

ROTH, S ^{[1
]}

MAINZ, B ^{[1
]}

STENZEL, O ^{[1
]}

SCHARFF, W ^{[1
]}

DWORSCHAK, W ^{[1
]}

KLEBER, R ^{[1
]}

KRUGER, A ^{[1
]}

JUNG, K ^{[1
]}

EHRHARDT, H ^{[1
]}

机构：

[1] UNIV KAISERSLAUTERN,FACHBEREICH PHYS,W-6750 KAISERSLAUTERN,GERMANY

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1991年 / 140卷

关键词：

D O I：

10.1016/0921-5093(91)90514-N

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A novel arrangement for the production of a microwave plasma by electron cyclotron resonance is described. Ion currents with current densities of up to 2.5 mA cm-2 can be homogeneously extracted from the plasma over surfaces having diameters of up to 10 cm. The microwave plasmatron can be operated by various working gases. Its application in the deposition of hydrogenated amorphous carbon (a-C:H) layer has been investigated. At a high deposition rate (200 nm min-1), a-C:H layers were deposited presenting properties which were also obtained by other workers who applied different techniques.

引用

页码：784 / 787

页数：4

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338878

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