ANODIC OXIDE-GROWTH ON ALUMINUM IN THE PRESENCE OF A THIN THERMAL OXIDE LAYER

被引：24

作者：

BERNARD, WJ

FLORIO, SM

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 10期

关键词：

D O I：

10.1149/1.2113571

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：2319 / 2322

页数：4

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