ION-BEAM ANALYSIS OF SILICA SOL-GEL FILMS - STRUCTURAL AND COMPOSITIONAL EVOLUTION

被引：15

作者：

KEDDIE, JL

GIANNELIS, EP

机构：

[1] Department of Materials Science and Engineering, Cornell University, Ithaca, New York

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1990年 / 73卷 / 10期

关键词：

composition; density; films; silica; solgel;

D O I：

10.1111/j.1151-2916.1990.tb06728.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Rutherford backscattering and forward recoil spectrometry have been used to determine the chemical composition and density of SiO2sol‐gel films. The as‐deposited films are relatively dense, because of considerable interpenetration of weakly branched silicate precursors, while they contain significant amounts of hydroxyl groups in their structure. Annealing in flowing Ar increases the density of the films with values approaching that of amorphous silica at temperatures as low as 450°C but it fails to completely remove all the hydroxyl groups from the structure. Copyright © 1990, Wiley Blackwell. All rights reserved

引用

页码：3106 / 3109

页数：4

共 13 条

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