EFFECT OF SURFACE-CHEMISTRY AND WORK FUNCTION IN SECONDARY ION MASS-SPECTROMETRY

被引：23

作者：

YU, ML

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期

关键词：

D O I：

10.1116/1.571915

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：500 / 502

页数：3

共 11 条

[1]

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[2]

ANDERSEN CA, 1969, INT J MASS SPECTROM, V2, P61

[3]

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[4]

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[8] SPUTTERING PROCESS AND SPUTTERED ION EMISSION [J].

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[9] WORK-FUNCTION DEPENDENCE OF NEGATIVE-ION PRODUCTION DURING SPUTTERING [J].

YU, ML .

PHYSICAL REVIEW LETTERS, 1978, 40 (09) :574-577

[10] MATRIX EFFECTS IN THE WORK-FUNCTION DEPENDENCE OF NEGATIVE-SECONDARY-ION EMISSION [J].

YU, ML .

PHYSICAL REVIEW B, 1982, 26 (08) :4731-4734

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