H-ATOM IMPACT-INDUCED CHEMICAL EROSION REACTION AT C-H FILM SURFACES

被引：107

作者：

HORN, A ^{[1
]}

SCHENK, A ^{[1
]}

BIENER, J ^{[1
]}

WINTER, B ^{[1
]}

LUTTERLOH, C ^{[1
]}

WITTMANN, M ^{[1
]}

KUPPERS, J ^{[1
]}

机构：

[1] UNIV BAYREUTH,D-95440 BAYREUTH,GERMANY

来源：

CHEMICAL PHYSICS LETTERS | 1994年 / 231卷 / 2-3期

关键词：

D O I：

10.1016/0009-2614(94)01233-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

C:H film surfaces which are subjected to a flux of thermal H atoms erode chemically via hydrocarbon, probably methyl, production. At the present H flux the erosion reaction is effective above 400 K and below 700 K, with a maximum around 600 K. The erosion efficiency at this temperature is approximate to 0.01 C atom per incoming K. A kinetic analysis of the erosion reaction and competing hydrogenation and dehydrogenation surface reactions under impact of K reveals an activation energy of approximate to 37 kcal/mol for the H atom impact induced erosion. As the efficiency of the erosion reaction depends on the incoming H flux, it may contribute as an important reaction in low-pressure diamond synthesis.

引用

页码：193 / 198

页数：6

共 14 条

[1] LOW-PRESSURE, METASTABLE GROWTH OF DIAMOND AND DIAMONDLIKE PHASES [J].