Local order and electrical properties of boron carbonitride films

被引:33
作者
Filipozzi, L
Derre, A
Conard, J
Piraux, L
Marchand, A
机构
[1] UNIV BORDEAUX 1,CTR RECH PAUL PASCAL,F-33600 PESSAC,FRANCE
[2] CNRS,DIV MAT,CTR RECH,F-45071 ORLEANS 02,FRANCE
[3] UNIV CATHOLIQUE LOUVAIN,UNITE PHYSICOCHIM & PHYS MAT,B-1348 LOUVAIN,BELGIUM
关键词
vapor deposited carbon; carbon alloy; Raman spectroscopy; nuclear magnetic resonance; Hall coefficient; magnetoresistance;
D O I
10.1016/0008-6223(95)00149-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thin films of carbon-boron-nitrogen alloys were prepared by chemical vapor deposition from gaseous mixtures of C2H2, BCl3, NH3, and H-2. Their turbostratic graphitic structure was investigated by electron probe micro analysis (EPMA), X-ray diffraction (XRD), Raman spectroscopy, and nuclear magnetic resonance. Those compounds were shown to be solid solutions with compositions varying in a continuous domain bounded by carbon, boron nitride, and BC3. Measurements of the electrical transport properties (conductivity and Hall coefficient) were performed from 295 down to 4.2 K and in the presence of magnetic fields up to 5 T. The behavior of these solid solutions can be interpreted in terms of a metal-non metal transition, when the carbon content decreases. Heat-treatment of these compounds between 1400 and 2000 degrees C involves strongly modified transport properties. The resistivity of all materials is lowered. But the main property change is that of the magnetoresistance.
引用
收藏
页码:1747 / 1757
页数:11
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