AUGER LINESHAPE MODULATION BY SCATTERING-INTERFERENCE OF PRIMARY ELECTRONS

被引：3

作者：

DIBONA, A ^{[1
]}

VALERI, S ^{[1
]}

机构：

[1] UNITA INFM,I-41100 MODENA,ITALY

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1995年 / 72卷

关键词：

D O I：

10.1016/0368-2048(94)02310-7

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

The electron-excited P LVV Auger lineshape has been investigated as a function of the beam incidence angle. The crystalline effects on the outgoing Auger electrons are avoided by using an angle-integrated electron analyser (CMA). Auger signal intensity as well as lineshape changes are observed on varying the beam incidence angle. The experimental results have been explained in terms of the angular dependence of the intensity and anisotropy of background, Auger signals from surface and bulk and their plasmon losses.

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页码：299 / 303

页数：5

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