CONDITIONS FOR UNIFORM GROWTH OF GAAS BY METALORGANIC CHEMICAL VAPOR-DEPOSITION IN A VERTICAL REACTOR

被引：19

作者：

COSTRINI, G

COLEMAN, JJ

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 06期

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D O I：

10.1063/1.334370

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：2249 / 2252

页数：4

相关论文

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