CHARACTERIZATION OF ROUGH SILICON SURFACES USING SPECTROSCOPIC ELLIPSOMETRY, REFLECTANCE, SCANNING ELECTRON-MICROSCOPY AND SCATTERING MEASUREMENTS

被引:10
作者
PICKERING, C [1 ]
GREEF, R [1 ]
HODGE, AM [1 ]
机构
[1] UNIV SOUTHAMPTON,DEPT CHEM,SOUTHAMPTON SO9 5NH,HANTS,ENGLAND
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1990年 / 5卷 / 02期
关键词
D O I
10.1016/0921-5107(90)90072-J
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A critical comparison of several techniques for the evaluation of imperfections in silicon-on-sapphire (SOS) wafers leads to the adoption of a model of the SOS surface based on an effective medium approximation treatment of the ellipsometric results. © 1990.
引用
收藏
页码:295 / 299
页数:5
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