SCALING PROPERTIES OF THE SHADOWING MODEL FOR SPUTTER DEPOSITION

被引：16

作者：

KRUG, J

MEAKIN, P

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,DIV RES,YORKTOWN HTS,NY 10598

[2] UNIV OSLO,DEPT PHYS,N-0316 OSLO,NORWAY

来源：

PHYSICAL REVIEW E | 1993年 / 47卷 / 01期

关键词：

D O I：

10.1103/PhysRevE.47.R17

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

We analyze a deterministic, one-dimensional solid-on-solid model for sputter deposition where the local growth rate is a function V(theta) of the exposure angle theta. For long times an algebraic height distribution N(h) approximately h-(1+p) develops, where the exponent p depends on the behavior of V(theta) close to theta=pi and the extremal statistics of the substrate roughness. Analytic predictions for p, based on scaling arguments, are verified by large-scale simulations using a hierarchical algorithm.

引用

页码：R17 / R20

页数：4

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