SCALING PROPERTIES OF THE SHADOWING MODEL FOR SPUTTER DEPOSITION

被引:16
作者
KRUG, J
MEAKIN, P
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,DIV RES,YORKTOWN HTS,NY 10598
[2] UNIV OSLO,DEPT PHYS,N-0316 OSLO,NORWAY
来源
PHYSICAL REVIEW E | 1993年 / 47卷 / 01期
关键词
D O I
10.1103/PhysRevE.47.R17
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
We analyze a deterministic, one-dimensional solid-on-solid model for sputter deposition where the local growth rate is a function V(theta) of the exposure angle theta. For long times an algebraic height distribution N(h) approximately h-(1+p) develops, where the exponent p depends on the behavior of V(theta) close to theta=pi and the extremal statistics of the substrate roughness. Analytic predictions for p, based on scaling arguments, are verified by large-scale simulations using a hierarchical algorithm.
引用
收藏
页码:R17 / R20
页数:4
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