DEFECTS IN SIMOX STRUCTURES - SOME PROCESS DEPENDENCE

被引:31
作者
MARGAIL, J
LAMURE, JM
PAPON, AM
机构
[1] CEA/DTA/LETI, Grenoble Cedex
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1992年 / 12卷 / 1-2期
关键词
D O I
10.1016/0921-5107(92)90254-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The remaining defects in separation by implanted oxygen (SIMOX) structures are shown to be dislocations, stacking faults and buried oxide discontinuities. The defect categories are reviewed and their density in standard material is given. Results of an enhanced chemical etching characterization technique are presented. The dependence of defect density on process parameters is given and the mechanisms of defect formation discussed. An experiment that allows "defect engineering" is also reported.
引用
收藏
页码:27 / 36
页数:10
相关论文
共 29 条
[1]  
BRUEL M, 1988, MIC ELECTRON ENG, V8
[2]   HIGH-QUALITY SI-ON-SIO2 FILMS BY LARGE DOSE OXYGEN IMPLANTATION AND LAMP ANNEALING [J].
CELLER, GK ;
HEMMENT, PLF ;
WEST, KW ;
GIBSON, JM .
APPLIED PHYSICS LETTERS, 1986, 48 (08) :532-534
[3]  
CHEEK TF, 1987, SILICON ON INSULATOR, V107, P53
[4]  
DEVEIRMAN A, 1991, 1ST SIMOX WORKSH GUI, V42
[5]   FORMATION OF LOW DISLOCATION DENSITY SILICON-ON-INSULATOR BY A SINGLE IMPLANTATION AND ANNEALING [J].
ELGHOR, MK ;
PENNYCOOK, SJ ;
NAMAVAR, F ;
KARAM, NH .
APPLIED PHYSICS LETTERS, 1990, 57 (02) :156-158
[6]  
ELGHOR MK, 1987, SILICN INSULATOR BUR, V107, P79
[7]  
ELGHOR MK, COMMUNICATION
[8]  
FECHNER PS, 1989 IEEE SOS SOI TE
[9]  
GUERRA MA, 1990, SOLID STATE TECH NOV, P75
[10]   FORMATION OF BURIED INSULATING LAYERS IN SILICON BY THE IMPLANTATION OF HIGH-DOSES OF OXYGEN [J].
HEMMENT, PLF ;
MAYDELLONDRUSZ, E ;
STEPHENS, KG ;
BUTCHER, J ;
IOANNOU, D ;
ALDERMAN, J .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 209 (MAY) :157-164